Title - Materials Processing
Whether it is nano era or micro era, materials processing is a key, enabling discipline. While the future emphasis in nanotechnology may be ' bottom-up' manufacturing, the world for now continues to rely on 'top-down' processing. Today's computer chips are produced after an assembly line of hundreds of processes including chemical vapor deposition (CVD), plasma processing etc. Structural materials are manufactured using CVD, chemical vapor infiltration etc. Biologists use cold plasmas to sterilize all objects bound for another planet in a spacecraft. Thruster designs utilize various types of plasmas. Even carbon nanotubes - the most exciting material of the nano era - are produced by CVD and plasma techniques. Common to all the above are aspects of gas phase chemistry, plasma physics and chemistry, and surface chemistry.

All the examples mentioned above are complex. Development of models and simulation codes is important to generate an understanding of the physical and chemical mechanisms. These simulations in general should self consistently include gas flow, energy balances, plasma transport (where appropriate), multicomponent/multitemperature analysis, equations addressing power coupling (Maxwell, Poisson equations) etc. The simulations also necessarily cover a wide range of time and length scales and often turn out to be "stiff" problems.

Complimentary experiments focusing on diagnostics which probe the gas phase, plasma phase and surface are necessary to provide data for model validation. For the models to be reliable, input data on chemical reactions and rate constants, transport/thermochemical properties, surface reactions and rate constants are all needed. Generation of these requires a combination of ab initio computational models and controlled measurements.

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This is a photogragh of a CVD reactor
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