Carbon Nanotube Interconnect
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Carbon Nanotube Interconnect
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| Array of vertically aligned carbon nanotubes grown using plasma enhanced chemical vapor deposition is intercalated with SiO2 to provide a bottom-up process for developing interconnects. These vertical interconnects are ideal for DRAM applications and three-dimensional architectures. | |||||||||
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If you have trouble viewing this page due to a disability, please contact Amara de Keczer at 650-604-3473 or email at adekeczer@mail.arc.nasa.gov.
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